| 摘要 |
<p>PURPOSE: A film forming apparatus and a raw material supplying apparatus are provided to easily discharge a liquid material from a raw material supplying pipe by extruding the liquid material from the upper side toward the lower side. CONSTITUTION: A reaction pipe(12) accepts a wafer(W). A raw material supplying apparatus(13) provides a liquid material to a vaporizer(11) from a raw material reservoir(14) through a raw material supplying pipe(15). A first raw material discharging pipe is branched from the lower end side of the raw material supplying pipe. An exhaust port(12a) makes the inner side of the reaction pipe vacuous. A heater(24) for heating the wafer within the reaction pipe is installed at the outer side of the reaction pipe.</p> |
