| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus for treating an organic zinc compound, capable of effectively suppressing production of particles induced by self decomposition of the organic zinc compound or its reaction with a trace amount of moisture by a simple method/structure. <P>SOLUTION: In the treatment apparatus, a tip 2b of a flow tube 2a connected to a liquid material feeder part 2 is arranged in a liquid layer of the liquid material and adjacent to a suppression treatment part 3. In a treatment tank 10, the liquid material contacts the suppression treatment part 3, thereby suppressing the production of impurities containing decomposition products in the liquid material. <P>COPYRIGHT: (C)2012,JPO&INPIT |
