| 摘要 |
PURPOSE: An anti-fingerprint coating method and an apparatus thereof are provided to form an anti-fingerprint coating surface at high productivity by evaporating anti-fingerprint materials with complexly using plasma reforming method, a sputter coating method, and a thermal evaporation method instead of an electron beam evaporation method. CONSTITUTION: An anti-fingerprint coating method is as follows. A thin film of SiO2(Silicon Dioxide) is evaporated on the surface of a base material(1) by using a sputter. Fluoride compound is evaporated on the surface of the base material having the SiO2 thin film through a thermal evaporation method. In order to increase the adhesion strength of the SiO2, the surface of the base material is reformed by plasma or ion beam before the evaporation of the SiO2 thin film.
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