NONVOLATILE RESISTIVE-SWITCHING RANDOM ACCESS MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
摘要
<p>PURPOSE: A nonvolatile resistive-switching random access memory device and a manufacturing method thereof are provided to perform a resistance switching operation without forming process by controlling thermal treatment temperature of a metal oxide layer. CONSTITUTION: A bottom electrode(20) is formed on a semiconductor substrate(10). A metal oxide layer(30) is formed on the bottom electrode. The metal oxide layer is thermally processed. An upper electrode(40) is formed on the metal oxide layer. A third dielectric layer is formed on the upper electrode.</p>
申请公布号
KR101166227(B1)
申请公布日期
2012.08.03
申请号
KR20110033544
申请日期
2011.04.12
申请人
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY