发明名称 Adjustment mechanism for charged particle beam apparatus
摘要 An adjustment mechanism for a charged particle beam apparatus which comprises a support surface disposed within the apparatus perpendicular to the beam axis, and a specimen holder disposed on the support surface and moveable transversely with respect to the beam axis. The holder includes apertures extending therethrough in a direction parallel to the beam axis which receive bearing means which engage the support surface. The bearing means have a dimension which is greater than that of the specimen holder in the direction of the beam axis and less than that of the apertures in the direction perpendicular to the beam axis. A coupling plate is disposed on the bearing means adjacent the specimen holder, and is coupled to adjusting means which is operable externally of the apparatus for adjusting the position of the plate, and thereby the position of the holder, with respect to the beam axis.
申请公布号 US3909611(A) 申请公布日期 1975.09.30
申请号 US19740443946 申请日期 1974.02.20
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 VON RAUCH, MORIZ
分类号 H01J37/20;(IPC1-7):H01J37/20 主分类号 H01J37/20
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