| 摘要 |
<p>PURPOSE: A split target device for sputtering and a sputtering method using the same are provided to secure uniform brightness of a substrate by evenly sputtering a deposition material on the substrate. CONSTITUTION: A split target device for sputtering(100) comprises a base plate(110) and a plurality of source units(140). The source units comprise a plurality of segment targets(120) which are attached in regular rows to one side of the base plate and a plurality of magnets(130) which are attached to the other side of the base plate in pairs with the segment targets. The source units are arranged in parallel to each other at an angle between a first direction corresponding to the row direction and a second direction perpendicular to the first direction.</p> |
