发明名称 |
PATTERN FORMING DEVICE AND PATTERN FORMING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique capable of further microfabrication and high aspect of a pattern in a pattern forming technique of forming a predetermined pattern on a substrate surface by applying and curing a coating liquid on the substrate surface. <P>SOLUTION: A side surface of a coating liquid for partition wall formation discharged from a discharge nozzle 523 to a substrate W is collectively irradiated with light converged by a lens 534 provided at the lower end of a light guide 533. The surface can be inhibited from rounding and the coating liquid can be inhibited from widening by surface tension generated by curing the side surface of the coating liquid prior to the other portions. Thereby, it is possible to form a partition wall B which is thin and uniform, and of which side surface is sharply raised up. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012248712(A) |
申请公布日期 |
2012.12.13 |
申请号 |
JP20110119950 |
申请日期 |
2011.05.30 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
SANADA MASAKAZU;IWASHIMA MASANOBU;FURUICHI TAKATSUGU;TERAKI KUNIKO |
分类号 |
H01L21/288;H01L21/28;H01L21/3205;H01L21/768;H01L31/04 |
主分类号 |
H01L21/288 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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