| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a production method of an original plate for a pattern alignment layer for three-dimensional display, for easy and mass production with high accuracy of a pattern retardation film, which is planar and has no roughness, for a three-dimensional display device. <P>SOLUTION: The production method includes: a second layer formation step of forming a second layer comprising a non-conductive material in a pattern of parallel strips on the surface of a first layer comprising a conductive material; a first polishing step of forming a first concavo-convex structure region in a first exposed portion by polishing in substantially a given direction a surface comprising the surface of the second layer and the first exposed portion; a third layer formation step of forming a third layer comprising a conductive material by electrolytic plating on the first concavo-convex structure region of the first exposed portion; a first etching step of forming a second exposed portion by selectively etching and removing the second layer while leaving the third layer; a second polishing step of forming a second concavo-convex structure region by polishing a surface comprising the surface of the third layer and the second exposed portion in a different direction from the above-mentioned direction; and a second etching step of exposing the first concave-convex structure region by removing the third layer. <P>COPYRIGHT: (C)2013,JPO&INPIT |
