发明名称 CHARGED PARTICLE BEAM DEVICE AND ELECTROSTATIC CHUCK DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a charged particle beam device which operates normally to hold even a warped sample in place. <P>SOLUTION: A charged particle beam device 1 of the present invention is designed to be the one which irradiates an electron beam 12 upon a sample 101 held on a sample stage 21 to generate an image of the sample 101. For this purpose, it includes a warp amount measurement unit 35 which measures the amount of a warp in the sample 101, an electrostatic chuck having a plurality of suction units 221 which take in the sample 101 by suction, lifting units 222 capable of moving up and down which are installed at the bottoms of each of the plural suction units 221, and a lifting control unit 633 which lifts or lowers the lifting units 222 according to the amount of a warp in the sample 101 measured by the warp amount measurement unit 35. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012248733(A) 申请公布日期 2012.12.13
申请号 JP20110120174 申请日期 2011.05.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TANAKA TOKUYUKI
分类号 H01L21/683;B23Q3/15;H01L21/68;H02N13/00 主分类号 H01L21/683
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