| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition capable of forming a photosensitive layer that is satisfactorily excellent in developability of an exposed part and developer resistance of an unexposed part and can be repeatedly developed with a weakly alkaline developer, and a photosensitive film using the same. <P>SOLUTION: A positive photosensitive resin composition contains (A) a novolac type phenolic resin obtained from metacresol and p-cresol, (B) a novolac type phenolic resin obtained from orthocresol, and (C) a compound which generates an acid under light. <P>COPYRIGHT: (C)2013,JPO&INPIT |
