ABERRATION MEASURING DEVICE, ABERRATION MEASURING METHOD, EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an aberration measuring device for accurately measuring an aberration of a detected optical system.

SOLUTION: The aberration measuring device for measuring an aberration of a detected optical system includes: an image forming unit for forming, in an image plane of the detected optical system, a belt-like first space image extending along a prescribed direction via the detection object optical system, and a belt-like second space image obtained by turning the first image by a prescribed angle in the image plane of the detected optical system; an opening arranged in the image plane of the detected optical system and having a triangular shape; and a measurement unit for measuring the aberration of the detected optical system on the basis of information on light of an image having passed through the opening among the first space image and information on light of an image having passed through the opening among the second space image.

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