PROXIMITY EXPOSURE APPARATUS, ALIGNMENT METHOD FOR PROXIMITY EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING PANEL SUBSTRATE FOR DISPLAY

摘要

PROBLEM TO BE SOLVED: To detect a position of an alignment mark on a mask and a position of an alignment mark in a base pattern of a substrate with high accuracy by acquiring sharp images of the alignment mark on the mask and of the alignment mark in the base pattern of the substrate and carrying out an image recognition process.

SOLUTION: An image of an alignment mark 2a on a mask 2 is recognized in such a manner that, while irradiating the alignment mark 2a on the mask 2 and an alignment mark 1a in a base pattern on a substrate 1 with illumination light from an illumination device 61 at a wavelength that results less transmitted light through a photoresist applied on the substrate 1 compared to the wavelength of light used to recognize the image of the alignment mark 1a on the base pattern of the substrate 1, the focus of each image acquiring device 51 is targeted to a lower face of the mask 2 by a focal position moving mechanism, and an image signal outputted by each image acquiring device 51 is processed by an image processor 50.

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