| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an oblique incidence interferometer capable of extending a measurement range and simplifying equipment. <P>SOLUTION: In an oblique incidence interferometer 1 which has: a light source 41; a light flux division part which divides original light from the light source 41; an irradiation part 43 which irradiates an object W to be measured with measurement light; a light flux synthesis part 44 which synthesizes the measurement light with reference light; and a light receiving part 45 which receives the synthesized light fluxes, it has: an interferometer body 30; a base 10 which holds the object W to be measured; a movement mechanism 20 capable of moving the interferometer body 30 along the object W to be measured; an auxiliary reflection mirror 51 arranged on extension of a movement axis of the interferometer body 30; an auxiliary light flux division part 52 which divides auxiliary light from the original light from the light source 41 to be irradiated on the reflection mirror 51; and an auxiliary light receiving part 55 which is installed in the interferometer body and receives the auxiliary light reflected on the auxiliary reflection mirror 51. <P>COPYRIGHT: (C)2013,JPO&INPIT |
