| 摘要 |
PURPOSE: A substrate processing apparatus is provided to uniformly deposit a thin film on a substrate by rotating a substrate holder while maintaining the horizontality of the substrate holder. CONSTITUTION: A substrate supporting unit(200) supports a substrate. A spraying unit(300) supplies process gas to the substrate. A substrate holder receives the substrate. A susceptor(230) forms a holder receiving groove. A rotation shaft rotates the susceptor.
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