| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device, along with a processing device, capable of keeping a removable performance of chemical liquid at a high level. <P>SOLUTION: An insulating film 2 is dry-etched using a resist pattern 3 as a mask, to form an opening 4. Ultraviolet ray whose wavelength is 200 nm or less is radiated to a reactive product 5 that sticks to an inner surface of the opening 4 at the time of dry-etching with the insulating film 2, so that an organic component contained in the reactive product 5 is discomposed. Using a chemical liquid, a sticking substance 6 remaining on the inner surface of the opening 4 is removed after decomposition of the organic component. In the opening 4 where the sticking substance 6 has been removed, a conductive film 7 is formed. <P>COPYRIGHT: (C)2013,JPO&INPIT |
