METHOD FOR FORMING MICROSTRUCTURE PATTERN BASED ON SOLUTION PROCESS

摘要

Disclosed is a method for forming a microstructure pattern based on a solution process. The method includes the steps of forming a photoresist pattern on a hydrophilic substrate; forming a self-assembled monolayer on the hydrophilic substrate formed thereon with the photoresist pattern; forming a self-assembled monolayer pattern by removing the photoresist pattern; coating a dewetting solution on the hydrophilic substrate formed thereon with the self-assembled monolayer pattern such that the dewetting solution is coated only on a hydrophilic surface of the hydrophilic substrate exposed through the self-assembled monolayer pattern by primary dewetting; and drying the dewetting solution coated on the hydrophilic surface of the hydrophilic substrate and allowing the dewetting solution to be hardened after flowing to an edge of the dewetting solution by secondary dewetting such that only a solute of the dewetting solution remains.