ANISOTROPIC WET ETCHING METHOD AND APPARATUS

摘要

PURPOSE: An anisotropic wet etching method and apparatus thereof are provided to save a material by reusing etchant and substrate particles. CONSTITUTION: A photoresist pattern is formed on a substrate. Micro holes are formed in the aperture region of the substrate. An etching injection system spreads etchant to the substrate. The etchant passes through the micro holes. A recovery vessel(TNK) collects the etchant.