发明名称 ITO FOR TRANSPARENT ELECTRODE AND METHOD FOR THE SAME
摘要 PURPOSE: An ITO for a transparent electrode and a method for manufacturing the same are provided to secure excellent surface roughness by reducing plasma damage on a GaN epi layer. CONSTITUTION: An ITO(Indium Tin Oxide) layer(130) is formed on an epi layer(120). The ITO layer includes a first area(132), a second area(134), and an interface(136). The interface separates the first area from the second area. The first area touches the epi layer. The second area is formed on the first area.
申请公布号 KR20130027991(A) 申请公布日期 2013.03.18
申请号 KR20120072319 申请日期 2012.07.03
申请人 SEOUL OPTO DEVICE CO., LTD. 发明人 KANG, JI HUN;LEE, CHOONG MIN;YANG, YOUNG EUN
分类号 H01L33/36;H01L33/42 主分类号 H01L33/36
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