发明名称 |
ITO FOR TRANSPARENT ELECTRODE AND METHOD FOR THE SAME |
摘要 |
PURPOSE: An ITO for a transparent electrode and a method for manufacturing the same are provided to secure excellent surface roughness by reducing plasma damage on a GaN epi layer. CONSTITUTION: An ITO(Indium Tin Oxide) layer(130) is formed on an epi layer(120). The ITO layer includes a first area(132), a second area(134), and an interface(136). The interface separates the first area from the second area. The first area touches the epi layer. The second area is formed on the first area.
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申请公布号 |
KR20130027991(A) |
申请公布日期 |
2013.03.18 |
申请号 |
KR20120072319 |
申请日期 |
2012.07.03 |
申请人 |
SEOUL OPTO DEVICE CO., LTD. |
发明人 |
KANG, JI HUN;LEE, CHOONG MIN;YANG, YOUNG EUN |
分类号 |
H01L33/36;H01L33/42 |
主分类号 |
H01L33/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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