发明名称 ELECTRON BEAM LITHOGRAPHIC METHOD AND ELECTRON BEAM LITHOGRAPHIC SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To improve accuracy of a drawing position in a circumferential direction when a fine pattern for a disk-like magnetic recording medium is drawn by electron beam scanning while rotating a rotary stage. <P>SOLUTION: In principle, pattern drawing based on a drawing data signal group of each predetermined area in a circumferential direction of each radial position is started after a lapse (t<SB POS="POST">n</SB>+&Delta;t<SB POS="POST">n</SB>) of a predetermined time period &Delta;t<SB POS="POST">n</SB>from a predetermined encoder pulse E<SB POS="POST">n</SB>generated before the predetermined area is positioned at an electron beam radiation position. When rotation speed variations generates an encoder pulse E<SB POS="POST">n+1</SB>that should be generated after a lapse of the predetermined time period &Delta;t<SB POS="POST">n</SB>, before a lapse of the predetermined time period &Delta;t<SB POS="POST">n</SB>from the encoder pulse E<SB POS="POST">n</SB>that is a reference for starting drawing in the predetermined area, pattern drawing in the area is started at its occurrence time t'<SB POS="POST">n+1</SB>. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013058291(A) 申请公布日期 2013.03.28
申请号 JP20110197319 申请日期 2011.09.09
申请人 FUJIFILM CORP 发明人 CHAI SATOSHI;IZAWA SEIICHI;USA TOSHIHIRO
分类号 G11B5/84;G03F7/20;H01L21/027 主分类号 G11B5/84
代理机构 代理人
主权项
地址