| 摘要 |
<p>PURPOSE: A photoresist composite which is capable of preventing development defect, a method of the same and a method of forming resist pattern are provided to have hydrophobicity and form resist film which is high in hydrophobicity. CONSTITUTION: A photoresist composite comprises a fluorine element containing polymer[A]with a structure unit(I) comprising hydrophilicity, a fluorine element containing polymer[B]with a structure unit(II) comprising an alkali releasing property and polymer comprising acid releasing property[C]. The polymer[A],[B]and[C]are different polymer. The structure unit (I) is indicated as structure formula 1. The structure unit (II) is indicated as structure formula 2. In the structure unit, R1 or R4 is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R2 is a hydrocarbon group or hydro carbon radical (m+1) of which carbon number is 1-20. R3 or R6 is a single bond, a hydrocarbon group radical of which carbon number is 1-20 or a hydrocarbon group radical of which carbon number is 4-20. R5 is (n+1) hydrocarbon group of which number is 1-20. R7 is a hydrocarbon group of which number is 1-20. X is a single bond, -CO-O-* and -O-. X is a single bond, -CO-O-* and -O-.</p> |
