| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide polishing liquid for metal films and a polishing method, which suppresses occurrence of erosion and a seam, and has high flatness of a surface to be polished, while keeping excellent polishing speed to an interlayer insulator. <P>SOLUTION: Polishing liquid for metal contains abrasive grains, a methacrylate polymer and water. <P>COPYRIGHT: (C)2013,JPO&INPIT |
