| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coating apparatus which can suppress the thickness of a material to be coated on the surface of a coating object from becoming uneven. <P>SOLUTION: The coating apparatus 10 comprises an applicator 50, material supply unit 80, and first, second, and third moving mechanisms. The applicator includes a meniscus pillar forming portion S and a recess 52 for recovery of surplus material. The material supply unit supplies the material to the applicator. The first moving mechanism 40 moves the position of the applicator relative to the coating surface along the coating surface. The second moving mechanism moves the position of the applicator relative to the coating surface so that the meniscus pillar formed between the forming part for the meniscus pillar and the coating surface moves to a position between the coating surface and the recess. The third moving mechanism moves the position of the applicator relatively toward and away from the coating surface. <P>COPYRIGHT: (C)2013,JPO&INPIT |
