Energy beam irradiation system i.e. ion implanter, for irradiating ionic beam as energy beam on plates, has arms transferring plates between tables and supports when supports are in plate reception region, respectively

摘要

The system i.e. ion implanter (100), has an energy beam emitting mechanism emitting an energy beam (IB) to a preset irradiation region (AR1), and two plate supports (31a, 32a) for mounting two plates (W1, W2). The plates are objects to be irradiated by the energy beam. A pair of transfer arms is moved to and from between a plate reception region and plate mounting tables (21a, 22a), respectively, and transfers the plates between the plate mounting tables and the plate supports when the plate supports are in the plate reception region, respectively.