发明名称 RESISTIVE MEMORY AND METHODS OF PROCESSING RESISTIVE MEMORY
摘要 Resistive memory and methods of processing resistive memory are described herein. One or more method embodiments of processing resistive memory include conformally forming a cell material in an opening in an interlayer dielectric such that a seam is formed in the cell material, forming a conductive pathway by modifying the seam, and forming an electrode on the cell material and the seam.
申请公布号 US2013099189(A1) 申请公布日期 2013.04.25
申请号 US201213691352 申请日期 2012.11.30
申请人 MICRON TECHNOLOGY, INC.;MICRON TECHNOLOGY, INC. 发明人 SANDHU GURTEJ S.;SMYTHE, III JOHN A.
分类号 H01L45/00 主分类号 H01L45/00
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