| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce influence of a surface condition of device feature region formed in a work piece in determining a key pattern. <P>SOLUTION: A key pattern determination method comprises: a key pattern candidate storage step in which any device formed in a work piece W is imaged by an imaging section 30 and an image of a feature region optimal as a key pattern is stored in an image storage part 113 as a key pattern candidate; plural image storage step in which the imaging section 30 and a chuck table 10 are moved relative to each other according to a regulation of a divided schedule line, plural devices are imaged by the imaging section 30 and the image having the same feature region as that is imaged by any device is stored in the image storage section 113; an integration image calculation step in which plural images stored in the image storage section 113 are integrated and the integrated images are calculated; and a key pattern determination step in which the integrated image is determined as a key pattern and stored in a key pattern storage section 111. <P>COPYRIGHT: (C)2013,JPO&INPIT |
