| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which rotates to perform liquid film treatment after immersing a substrate in a solution layer to clean the substrate. <P>SOLUTION: A substrate processing apparatus includes: a storage tank for storing a liquid and forming a solution layer; a substrate support part which rotatably supports a substrate in a horizontal manner and increases and decreases a clearance from the storage tank; and a cup part which is provided at the outer peripheral side of the storage tank and receives a liquid flown off from the substrate by rotating the substrate at a position where the substrate support part separates from the storage tank. <P>COPYRIGHT: (C)2013,JPO&INPIT |
