发明名称 LIQUID IMMERSION MEMBER, LIQUID IMMERSION EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid immersion member capable of suppressing generation of poor exposure. <P>SOLUTION: A liquid immersion member is arranged at least a part of the surroundings of an optical member having an emission surface to which exposure light is emitted and an outside surface which is arranged in the surroundings of the emission surface in a liquid immersion exposure apparatus. The liquid immersion member has: a first member which has a first inner surface at least a part of which faces the outside surface via a first gap, and a first lower surface which an object facing the emission surface can face, and forms a first liquid immersion space of first liquid on the side of the emission surface; a second member which is arranged outside the first member to an optical path, and has a second lower surface which the object can face; a first supply port which is arranged at one or both of the first member and the second member, and supplies the first liquid; a first collection port which is arranged at one or both of the first member and the second member, and collects at least a part of the first liquid from the first supply port; and a second supply port which faces a second gap between the first member and the second member, and supplies second liquid to the second gap. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013106002(A) 申请公布日期 2013.05.30
申请号 JP20110250978 申请日期 2011.11.16
申请人 NIKON CORP 发明人 SATO MASAMICHI
分类号 H01L21/027 主分类号 H01L21/027
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