| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique advantageous in measuring a pattern recess thickness. <P>SOLUTION: A method for determining a light incidence condition used for calculating a residual film thickness combines a plurality of first incidence conditions of light generating a reflectance in a first polarization state in which difference in measurement sensitivity of a residual film thickness RLT and a pattern thickness is large, and a plurality of second incidence conditions of light generating a reflectance in a second polarization state having excellent measurement sensitivity of the residual film thickness RLT, to obtain a plurality of combination types. A regression equation is prepared to each of the plurality of combination types. The regression equation has intensity of the obtained reflectance as an independent variable and the thickness of a recess obtained using the information as a dependent variable. Among the prepared regression equations, a first incidence condition corresponding to a regression equation in which a regression error satisfies an allowable condition is determined as an incidence condition for generating a reflectance in the first polarization state, and a second incidence condition corresponding to the regression equation is determined as an incidence condition for generating a reflectance in the second polarization state, respectively. <P>COPYRIGHT: (C)2013,JPO&INPIT |
