VAPORIZED MATERIAL SUPPLY APPARATUS, SUBSTRATE PROCESSING APPARATUS HAVING SAME AND VAPORIZED MATERIAL SUPPLY METHOD

摘要

A vaporized material supply apparatus includes: a storage tank for storing a liquid material; a first temperature controller for controlling the storage tank to be at a first temperature; a carrier gas inlet line for introducing a carrier gas into the storage tank; a processing gas outlet line for discharging a processing gas out of the storage tank; a container having an inlet port connecting to the processing gas outlet line and an outlet port via which the processing gas is discharged; an interference member to interfere with flow of the processing gas in the container; and a second temperature controller for controlling the container to be at a second temperature lower than the first temperature.