| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film member excellent in gas barrier properties of preventing oxygen, water vapor and a gas coming out of a substrate from passing therethrough, and to provide a method of producing the same. <P>SOLUTION: The film member includes a substrate made from a resin film and an aluminum oxynitride (AlON) film disposed at least on one of the obverse and reverse faces thereof, with the composition of the aluminum oxynitride film comprising, Al: 39 to 55 at%, O: 7 to 60 at%, and N: 1 to 50 at%. The method of producing the film member comprises: a decompression process of keeping a chamber 8 at a predetermined degree of vacuum subsequent to placing a substrate 20 in the chamber 8 of an apparatus 1 of forming a film by way of sputtering, in a manner of causing the substrate 20 to face an aluminum target 30; and a film forming process of introducing a carrier gas and a raw material gas comprising nitrogen into the chamber 8 to form an aluminum oxynitride film on the film-forming face of the substrate 20 at a predetermined degree of vacuum, in an atmosphere where the ratio of the oxygen pressure relative to the nitrogen pressure in the chamber 8 is not greater than 20%. <P>COPYRIGHT: (C)2013,JPO&INPIT |
