| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a solid state image sensor in which a processing treatment for processing a light-transmissive insulating film placed on a light reception part to a film thickness suitable to respective colors of color filters placed at the light reception part is completed by performing a photography process, an etching process, and a resist removing process each once. <P>SOLUTION: In the method of manufacturing a solid state image sensor, a gradation exposure mask 11 is used after a photoresist film 10 is formed on a first insulating film 3m to expose the photoresist film 10 such that exposure light Le is not made incident on a part corresponding to a light reception part 2 where an R color filter is placed, a small amount of exposure light Le is made incident on a part corresponding to a light reception part 2 where a G color filter is placed, and much exposure light Le is made incident on a part corresponding to a light reception part 2 where a B color filter is placed. <P>COPYRIGHT: (C)2013,JPO&INPIT |
