发明名称 TARGET DEVICE, SPUTTERING APPARATUS AND METHOD FOR MANUFACTURING A TARGET DEVICE
摘要 To provide a target device that can easily be reused in which the amount of gas discharge is small. The present invention is a target device including a backing plate and a target plate that is fixed to the backing plate with a metal brazing material, in which a protective film made of a TiN thin film in which a proportion of (111) plane is at a maximum is formed on an exposed portion of the backing plate. The discharge amount of gas is small, and the brazing material that adheres when fixing the target plate can be easily peeled off.
申请公布号 US2013186752(A1) 申请公布日期 2013.07.25
申请号 US201213710775 申请日期 2012.12.11
申请人 ULVAC, INC.;ULVAC, INC. 发明人 KADOWAKI YUTAKA;TAKAHASHI KAZUTOSHI;SATO MASARU;LIN CHENGFU
分类号 C23C14/34 主分类号 C23C14/34
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