发明名称 MOUNTING SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a mounting substrate capable of suppressing generation of voids in an electrode of a semiconductor element due to electromigration, and to provide a semiconductor device and a method for manufacturing the semiconductor device.SOLUTION: A mounting substrate 9 includes: a connection pad 2 mainly composed of copper and provided in a mounting part 1a of an insulating substrate 1; a solder bump 3 provided on the connection pad 2. Copper particles 4 coated with a metal layer 5 made of at least one metal material selected from nickel, iron, cobalt, platinum, and palladium are added to the solder bump 3. Since an electrode can be coated with a copper-tin alloy formed by a copper component of the copper particles 4, voids of the electrode due to electromigration are suppressed.
申请公布号 JP2013168628(A) 申请公布日期 2013.08.29
申请号 JP20120198525 申请日期 2012.09.10
申请人 KYOCERA CORP 发明人 ISHIZAKI YUICHIRO
分类号 H05K3/34;H01L21/60;H01L23/12;H05K1/18 主分类号 H05K3/34
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