| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate placement base which prevents the occurence of leaking of an atmosphere and the deterioration of in-plane uniformity of the processing while unfailingly supplying power to a heater electrode for temperature control, and to provide a plasma etching apparatus.SOLUTION: A substrate placement base includes: an insulation member where an electrode for an electrostatic chuck is buried and a heater electrode for temperature control is buried; and a plate member for the temperature control having a medium circulation passage for the temperature control that is used for circulating a medium for the temperature control therein. The substrate placement base further includes: a cylindrical member disposed in a through hole disposed in the plate member for the temperature control and made of an insulation material; and a lead wire positioned in the cylindrical member and having one end connected with the heat electrode for the temperature control and the other end connected with a connection terminal part provided at the lower surface side of the cylindrical member. The substrate placement base and a plasma etching apparatus including the substrate placement base are provided. |
