发明名称 RESISTIVE MEMORY DEVICE AND FABRICATION METHOD THEREOF
摘要 <p>PURPOSE: A resistive memory device and a fabrication method thereof are provided to reduce thermal attack by fabricating diodes at low temperatures. CONSTITUTION: A variable resistive layer is formed on a semiconductor substrate. A semiconductor substrate forms an infrastructure. A lower electrode (220) is formed on the variable resistive layer. A diode (230) is formed on the lower electrode. An upper electrode (240) is formed on the diode. [Reference numerals] (210) Upper changeable layer; (220) Lower electrode; (232) First electrode; (234) Second electrode; (240) Upper electrode</p>
申请公布号 KR20130101351(A) 申请公布日期 2013.09.13
申请号 KR20120022436 申请日期 2012.03.05
申请人 SK HYNIX INC. 发明人 LEE, MIN YONG;LEE, YOUNG HO;BAEK, SEUNG BEOM;LEE, JONG CHUL
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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