发明名称 |
RESISTIVE MEMORY DEVICE AND FABRICATION METHOD THEREOF |
摘要 |
<p>PURPOSE: A resistive memory device and a fabrication method thereof are provided to reduce thermal attack by fabricating diodes at low temperatures. CONSTITUTION: A variable resistive layer is formed on a semiconductor substrate. A semiconductor substrate forms an infrastructure. A lower electrode (220) is formed on the variable resistive layer. A diode (230) is formed on the lower electrode. An upper electrode (240) is formed on the diode. [Reference numerals] (210) Upper changeable layer; (220) Lower electrode; (232) First electrode; (234) Second electrode; (240) Upper electrode</p> |
申请公布号 |
KR20130101351(A) |
申请公布日期 |
2013.09.13 |
申请号 |
KR20120022436 |
申请日期 |
2012.03.05 |
申请人 |
SK HYNIX INC. |
发明人 |
LEE, MIN YONG;LEE, YOUNG HO;BAEK, SEUNG BEOM;LEE, JONG CHUL |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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