发明名称
摘要 Methods and systems process electrically conductive links on or within a semiconductor substrate (740) using multiple laser beams. For example, a method utilizes N series of laser pulses to obtain a throughput benefit, wherein N / 2. The links are arranged in a plurality of substantially parallel rows extending in a generally lengthwise direction. The N series of laser pulses propagate along N respective beam axes until incident upon selected links. The pattern of resulting laser spots may be on links in N distinct rows, on distinct links in the same row, or on the same link, either partially or completely overlapping. The resulting laser spots may be offset from one another in the lengthwise direction of the rows or offset from one another in a direction perpendicular to the lengthwise direction of the rows, or both.
申请公布号 JP5294629(B2) 申请公布日期 2013.09.18
申请号 JP20070516763 申请日期 2005.06.16
申请人 发明人
分类号 H01L21/82;B23K26/00;B23K26/06;B23K26/067;B23K26/38;B23K26/40;H01S3/00 主分类号 H01L21/82
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