发明名称 COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a technology capable of suppressing a decrease in operating efficiency of a coating and developing apparatus, and preventing complication of an operation of substrate transport means, when abnormalities occur in a hydrophobic treatment module or a unit block for forming a coating film, or when performing maintenance.SOLUTION: A coating and developing apparatus is configured to comprise: an N-multiplexed unit block for coating on which the same coating film is formed respectively; and a hydrophobing module of N groups which performs hydrophobic treatment on a substrate before forming a coating film, and a delivery mechanism which is controlled to deliver the substrate from the hydrophobing module of the N groups to a corresponding unit block for coating, respectively, in a lifting and transporting block between a carrier block and a processing block.
申请公布号 JP2013191881(A) 申请公布日期 2013.09.26
申请号 JP20130119047 申请日期 2013.06.05
申请人 TOKYO ELECTRON LTD 发明人 MATSUOKA NOBUAKI;HAYASHI SHINICHI;ENOKIDA SUGURU
分类号 H01L21/027;B05C9/10;G03F7/16;G03F7/30 主分类号 H01L21/027
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