| 摘要 |
An exposure apparatus has an optical device configured to be capable of diffusing coherent light beams from respective points to the entire region of at least a specific zone, an irradiation unit configured to irradiate the coherent light beams to the optical device so that the coherent light beams scan a surface of the optical device, and a spatial light modulator that is provided at a location overlapped with the specific zone and illuminated by the illumination device. The irradiation unit makes the coherent light beams scan the surface of the optical device by changing propagation directions of the coherent light beams, and coherent light beams modulated by the spatial light modulator are guided to a surface of a photosensitive medium.
|
