发明名称 |
METHOD FOR CLEANING TEXTURED SILICON WAFERS |
摘要 |
Substrates for solar cells are prepared by the reverse of the standard RCA clean. The substrates are first cleaned in RCA-2 solution and then in RCA-1 solution. A pyramids rounding step using HF/HNO3 solution is inserted between the two RCA clean procedures. This solves all the issues relating to surface contaminations and sharp areas. It also avoids the stain layer on the surface to some extent by RCA-1 treatment. A thin layer of amorphous or micro-crystalline intrinsic silicon may be deposited to passivate the surface.
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申请公布号 |
US2013252427(A1) |
申请公布日期 |
2013.09.26 |
申请号 |
US201213430587 |
申请日期 |
2012.03.26 |
申请人 |
SONG GUANGHUA;SUNPREME, LTD. |
发明人 |
SONG GUANGHUA |
分类号 |
H01L21/311;B08B3/08;B44C1/22;C23G1/02;C23G1/14 |
主分类号 |
H01L21/311 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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