发明名称 Temporary semiconductor structure bonding methods and related bonded semiconductor structures
摘要 <p>The invention relates to temporary semiconductor structure bonding methods and related bonded semiconductor structures. Methods of fabricating semiconductor structures include implanting atom species into a carrier die or wafer to form a weakened region within the carrier die or wafer, and bonding the carrier die or wafer to a semiconductor structure. The semiconductor structure may be processed while using the carrier die or wafer to handle the semiconductor structure. The semiconductor structure may be bonded to another semiconductor structure, and the carrier die or wafer may be divided along the weakened region therein. Bonded semiconductor structures are fabricated using such methods.</p>
申请公布号 KR101311332(B1) 申请公布日期 2013.09.27
申请号 KR20110058448 申请日期 2011.06.16
申请人 发明人
分类号 H01L21/20;H01L21/336;H01L23/48;H01L29/78 主分类号 H01L21/20
代理机构 代理人
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