| 摘要 |
A wafer holder is provided to uniformly process the wafer back surface by maintaining the residual time of the plasma generated between the wafer and the electrode. The holder body(100) comprises the settling portion(120) of ring shape and the sidewall part(130) that is extended from the settling portion. The holder body is divided into the predetermined number of parts. The holder body is made of the vertically divided circumference body. One or more cylindrical body locking(150) screws the circumference bodies. The circumference body includes the joint groove(151) and the fastener(152) to joint the joint groove with adjacent circumference body. |
