发明名称 |
TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURE AND METHOD OF MANUFACTURING MICROSTRUCTURE USING THE SAME |
摘要 |
The objects of the present invention are to provide a treatment liquid able to inhibit pattern collapse in a microstructure such as a semiconductor device or a micromachine, as well as a method of manufacturing a microstructure using the same. Means to solve the problems is to treat a microstructure with a treatment liquid for inhibiting pattern collapse in a metal microstructure comprising an alkylphosphonic acid or salt thereof in which said alkyl moiety contains 6 to 18 carbon atoms, water, and a water soluble solvent.
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申请公布号 |
US2013260571(A1) |
申请公布日期 |
2013.10.03 |
申请号 |
US201313799522 |
申请日期 |
2013.03.13 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
MATSUNAGA HIROSHI;AOYAMA KIMIHIRO |
分类号 |
C09D7/12;H01L21/033 |
主分类号 |
C09D7/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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