发明名称 |
YOUNG'S MODULUS MEASURING METHOD OF ABRASIVE GRAIN OF CHEMICAL MECHANICAL POLISHING SLURRY |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for quickly measuring a Young's modulus of an abrasive grain of chemical mechanical polishing slurry.SOLUTION: A Young's modulus measuring method of an abrasive grain of chemical mechanical polishing slurry comprises the steps of: fixing a plurality of abrasive grains powders to a sample stand by adhesive agents; setting the sample stand to a scanner of an atomic force microscope comprising a cantilever having a predetermined spring constant and a probe; setting a plurality of probe positions with respect to the probe; repeating contact and release of the probe with and from respective abrasive grains so as to correspond to the plurality of probe positions set; generating a force curve measured by the atomic force microscope by the contact and the release of the probe; converting a vertical axis to force and a horizontal axis to a deformation depth and graphing a positional relation between the force and the probe by using a Young's modulus calculation software; and obtaining a Young's modulus of each abrasive grain from the positional relation between the force and the probe. |
申请公布号 |
JP2013217694(A) |
申请公布日期 |
2013.10.24 |
申请号 |
JP20120086305 |
申请日期 |
2012.04.05 |
申请人 |
HITACHI CHEMICAL CO LTD |
发明人 |
HONBO MICHIKO;ENOMOTO KAZUHIRO;YOSHIKAWA SHIGERU;OTA MUNEHIRO |
分类号 |
G01Q60/24;B24B37/00;C09K3/14;G01N3/40;H01L21/304 |
主分类号 |
G01Q60/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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