发明名称 POLISHING PAD
摘要 PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving the retention capability and dispersibility of a polishing liquid within a polishing surface.SOLUTION: A polishing pad 10 has a urethane sheet 2 made of polyurethane resin. The urethane sheet 2 has a polishing surface Sp for performing polishing process on a to-be-polished object. There are provided three sorts of differently-shaped grooves 8 on the polishing surface Sp side. The grooves 8 are constituted of eight pieces of discharge grooves 8A of convex involute curved shape on the front side against a rotational direction Rd, eight pieces of incurrent grooves 8B of convex curved shape in the rear side, and one piece of dispersing groove 8C of a circle shape centering on a center Po connecting between the intersections Pi between the discharge grooves 8A and the incurrent grooves 8B. The discharge grooves 8A and the incurrent grooves 8B are formed across from the center part of the polishing surface Sp to the outer edge. Slurry is discharged from the discharge grooves 8A, flows in from the incurrent grooves 8B, while the slurry is dispersed within the polishing surface Sp by the dispersing groove 8C.
申请公布号 JP2013248693(A) 申请公布日期 2013.12.12
申请号 JP20120124206 申请日期 2012.05.31
申请人 FUJIBO HOLDINGS INC 发明人 ITOYAMA MITSUNORI
分类号 B24B37/26;H01L21/304 主分类号 B24B37/26
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