| 发明名称 |
PHOTORESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, COMPOUND AND METHOD OF PRODUCING COMPOUND |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist composition superior in LWR performance, resolution, rectangularity of a cross-sectional shape, and focal depth.SOLUTION: A photoresist composition contains [A] a polymer having a structural unit represented by the following formula (1), and [B] an acid generator. |
| 申请公布号 |
JP2013254084(A) |
申请公布日期 |
2013.12.19 |
| 申请号 |
JP20120129404 |
申请日期 |
2012.06.06 |
| 申请人 |
JSR CORP |
发明人 |
IKUI NORITO;IKEDA NORIHIKO |
| 分类号 |
G03F7/039;C07D307/33;C08F24/00 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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