LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a liquid processing method which prevent a process liquid from remaining on a lift pin after a substrate is dried and thereby prevents the process liquid from adhering to a rear surface of the substrate after the liquid processing is performed thereto.SOLUTION: A substrate cleaning apparatus 10 includes: a holding plate 30 holding a substrate W; a lift pin plate 20 which is provided above the holding plate 30 and has a lift pin 22 supporting the substrate W from below; and a process liquid supply part 40 supplying a process liquid to a rear surface of the substrate W held by the holding plate 30. The process liquid supply part 40 includes a head part 42 that is provided so as to close a through hole 20a of the lift pin plate 20. The process liquid supply part 40 and the lift pin plate 20 move up and down relative to the holding plate 30.