RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, METHOD OF PRODUCING COMPOUND, AND POLYMER COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide: a resist composition excellent in lithographic properties; a method of forming a resist pattern using the resist composition; a polymer compound useful as a base material component in the resist composition; a novel compound forming the polymer compound; and a method of producing the novel compound.SOLUTION: Provided is a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid and which includes a base component (A) that exhibits changed solubility in a developing solution by the action of acid. The base component (A) contains a polymer compound (A1) having a constitutional unit (a0) represented by the specified general formula (a0-1), (In the formula, R is a hydrogen atom, a C1-C5 alkyl group, or a C1-C5 halogenated alkyl group; Xis a sulfur atom or an oxygen atom; and Ris a lactone-containing cyclic group.