| 摘要 |
PROBLEM TO BE SOLVED: To facilitate layout by improving freedom in disposing a head of an encoder system for measuring the position of a mobile, in a liquid immersion exposure device.SOLUTION: The exposure device comprises: a wafer stage WST disposed on a base board 12 and including scales 39A and 39B disposed on both sides of a placement area for a wafer W with respect to an X direction and with a Y direction as a length direction for forming two-dimensional grids; a local liquid immersion device for supplying liquid to under a projection optical system PL; a driving device for moving the wafer stage from one of an exposure position where liquid immersion exposure of the wafer is performed, and an exchange position of the wafer to the other position; and an encoder system including a plurality of heads 62A', 62B', 62C' and 62D' whose positions are different from one another with respect to the X direction, and measuring the position of the wafer stage with respect to three freedom directions within the XY plane through the heads opposed to the two scales, respectively. |
