发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME, AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device and a manufacturing method of the same, and an electronic apparatus, which can ease a stress applied to an organic semiconductor film to inhibit deterioration in characteristics.SOLUTION: A semiconductor device of the present disclosure comprises a gate electrode, a pair of source/drain electrodes and an organic semiconductor film which forms a channel. The pair of source/drain electrodes are formed and a connection layer, a buffer layer and a wiring layer are laminated in this order on the organic semiconductor film.
申请公布号 JP2014041874(A) 申请公布日期 2014.03.06
申请号 JP20120182465 申请日期 2012.08.21
申请人 SONY CORP 发明人 ISHII YUI;ONO HIDEKI
分类号 H01L29/786;G02F1/1368;G09F9/30;H01L21/28;H01L21/336;H01L29/417;H01L51/05 主分类号 H01L29/786
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