| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography-friendly mask data preparation method maximizing minimum of a distance between divided patterns while reducing the number of partitions of a mask pattern.SOLUTION: A mask data preparation method prepares data of multiple masks used for multi-exposure to expose to a base plate using other mask by a computer after the base plate is exposed using one mask, and comprises the steps of: acquiring data of a pattern including multiple pattern elements (S100); determining an arrangement constraint condition of the pattern (S101); formulating the arrangement constraint condition (S102); analyzing a distance between the patterns (S103); formulating the constraint condition of the distance (S104); and applying a first variable indicating the number of partitions of the pattern and a second variable indicating the distance for all patterns to a cost function and dividing the pattern (S105). |
